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99.5% Annealed Molybdenum Sputtering Target Rotatable ASTM B386

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99.5% Annealed Molybdenum Sputtering Target Rotatable ASTM B386

Application : Aerospace, Automotive, Electronics, Medical

Chemical Composition : Molybdenum

Form : Powder, Sheet, Rod, Plate, Wire, Tube, Foil, Crucible, Ingot

Product Name : Molybdenum Products

Size : Customized

Surface Finish : Polished, Ground, Annealed

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Molybdenum Rotatable Sputtering Target

Molybdenum Sputtering Target Description

In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting point, high electrical conductivity, low specific impedance, good corrosion resistance and good environmental properties.

Parameters

Material:	Molybdenum	Shape:	Plate
Purity:	99.5%	Density:	10.2g/cm
Color:	Silver	Standard:	ASTM B386
Size:	Cusomized	Surface:	Bright
High Light:	99.95% Molybdenum Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3

Manufacturing Range(Molybdenum rotary sputtering targets)

OD(mm)	ID(mm)	Length(mm)	Custom made
140-180mm	125-135mm	100-3300	Custom made

Manufacturing Range (Molybdenum Planar Sputtering Target)

Rectangle	Length (mm)	Width (mm)	Thickness(mm)	Custom Made
Rectangle	10 - 3000	10 - 800	1.0 - 50.8
Circular	Diameter (mm)		Thickness (mm)
Circular	10 - 1000		1.0 - 100

Specification

Composition	Mo (Mo1, TZM)
Purity	99.95%
Density	10.2 g/cm3
Grain Sizes	100 m2 or on request
Roughness	Ra≤0.4m
Flatness tolerance	<4um

Remark: all the specifications can be customized according to requirements of customers.

Atomic number	42
CAS number	7439-98-7
Atomic mass	95.94 [g/mol]
Melting point	2620 °C
Boiling point	4639 °C
Density at 20 °C	10.22 [g/cm]
Crystal structure	Body-centered cubic
Coefficient of linear thermal expansion at 20 °C	5.210-6[m/(mK)]
Thermal conductivity at 20 °C	142 [W/(mK)]
Specific heat at 20 °C	0.25 [J/(gK)]
Electrical conductivity at 20 °C	17.9106[S/m]
Specific electrical resistance at 20 °C	0.056 [(mm2)/m]

Applications:

Thin-film solar industry, solar cells, surface engineering

Touch control industry, flat panel displays

Semiconductor industry, microelectronics, automotive lights and decorative coating,

Coated glass industry(including architectural glass, automotive glass, optical glass and other films), etc.

Product Tags:

Annealed Molybdenum Sputtering Target

Molybdenum Sputtering Target Rotatable

99.5% Annealed Molybdenum Sputtering Target Rotatable ASTM B386 Images

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